Model 6000型 OAI 掩膜光刻机

OAI 掩膜光刻机 Model 6000型的特点和优点

•高吞吐量（180 wph，掩模模式)和生产和研发的运行成本

•ABO光学与光均质器，以实现所需各种电阻的分辨率和曝光

•用于大深度Foucs的特殊光学

•灵活处理基板从2“平方到12”平方

•可手动或自动上料

配置。

•系统配置顶部和/或底部侧面/ IR 自动对准Vision ProR软件

•适用于各种基材尺寸和类型

•基于Windows的软件

•菜单驱动的GUI与工艺配方存储

•全场曝光，提高吞吐量

•顶部加载支架，方便，快速，安全的更换

•可选调平零接触处理

•双臂4轴机器人搬运系统(可选)

•自调平工装隔振

•的服务支持(约95%的服务水平)

Mask Aligner - Model 6000 Features and Benefits

• High throughput (180 wph, first mask mode) and Lowest Cost of operation for production and R&D
• ABO Optics with light homogenizer to achieve required resolutions & exposures for various resists
• Special Optics for Large Depth of Foucs
• Flexibility with substrate handling from 2”sq to 12”sq
• Comes in manual loading or automated loading configurations.
• System configuration with top and/or bottom side / IR auto alignment with Cognex Vision ProR Software
• Adaptable to various substrate sizes and types
• Windows based software
• Menu driven GUI with process recipe storage
• Full field exposure for higher throughput
• Top load mask holder for easy, fast and safe mask replacements
• Optional Global leveling for zero contact processing
• Dual arm 4-axis robot handling system (optional)
• Self leveling tooling vibration isolation
• Superior service support (~95% service level)